Patent · US Active

Sputter target utilization

US8273221B2 · kind B2 · utility

6Cited by

8References

14Claims

0Family size

Assignee

Oerlikon Solar AG, Trubbach · CH

Inventors

Stefan Schneider · Aachen, DE
Marcel Müller · Chesterfield, US
Jiri Vyskocil · Winterthur, CH
Israel A. Wagner · Monsey, US

Key dates

Filing date	Dec 13, 2006
Grant date	Sep 25, 2012
Priority date	—
Expiry date	Sep 20, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/347
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An apparatus and method are provided for improved utilization of a sputter target in the longitudinal end regions. The focus of erosion in the end regions is widened, thereby extending the useful life of the target. This provides improved efficiency and reduces waste because a greater proportion of the target material in the more expansive central region can be harvested, because the target is utilized for a longer period of time.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.