Systems and methods for forming magnetic nanocomposite materials
US8273407B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Jan 29, 2007 |
| Grant date | Sep 25, 2012 |
| Priority date | — |
| Expiry date | Jul 26, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F41/22
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of fabricating a film of magnetic nanocomposite particles including depositing isolated clusters of magnetic nanoparticles onto a substrate surface and coating the isolated clusters of magnetic nanoparticles with an insulator coating. The isolated clusters of magnetic nanoparticles have a dimension in the range between 1 and 300 nanometers and are separated from each other by a distance in the range between 1 and 50 nanometers. By employing PVD, ablation, and CVD techniques the range of useful film thicknesses is extended to 10-1000 nm, suitable for use in wafer based processing. The described methods for depositing the magnetic nanocomposite thin films are compatible with conventional IC wafer and Integrated Passive Device fabrication.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.