Apparatus, system, and method for increasing measurement accuracy in a particle imaging device
US8274656B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 30, 2010 |
| Grant date | Sep 25, 2012 |
| Priority date | — |
| Expiry date | Apr 19, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30024
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus, system, and method for increasing measurement accuracy in imaging cytometry. The system may include a light detector configured to measure light emitted by a first particle and light emitted by a second particle, where the measured light from the second particle at least partially overlaps the measured light from the first particle in an overlap region. Additionally, the system may include a processor coupled to the light detector, where the processor is configured to determine a contribution of light from the first particle in the overlap region and determine a contribution of light from the second particle in the overlap region. The processor may also be configured to subtract the contribution of light from the second particle from the contribution of light from the first particle and determine the intensity of light emitted by the first particle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.