Radiofrequency plasma generation device
US8278807B2 · kind B2 · utility
18Cited by
6References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2007 |
| Grant date | Oct 2, 2012 |
| Priority date | — |
| Expiry date | May 3, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01T13/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A device including two plasma generation electrodes, a series resonator having a resonant frequency above 1 MHz and including a capacitor with two terminals, and an induction coil surrounded by a screen, the capacitor and the coil being placed in series, the electrodes being connected to the respective terminals of the capacitor. The ratio of the spark plug to the radius of the screen is equal to 0.56. The device can optimize the Q-factor of such a device by adjusting the radius of the coil to that of the screen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.