Grid for vacuum electron device and method for manufacture of same
US8278812B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 2008 |
| Grant date | Oct 2, 2012 |
| Priority date | — |
| Expiry date | Nov 9, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J23/065
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A grid component for use with a vacuum electron device (VED), such as an inductive output tube (IOT), includes a skirt that adds structural support and aids in alignment. The grid component has a dome in which a grid pattern is formed and includes an annular, concentric flange surrounding the dome. The skirt is formed concentrically around the flange. Alignment orifices may be provided in the flange for passage of alignment pins in the assembled product. The grid, flange, and skirt are a unitary component and are formed by a chemical vapor deposition (CVD) or similar process, in which a mandrel is used to provide a deposition surface. The mandrel is placed in a furnace, and a high-temperature CVD process is used to break down a hydrocarbon gas to thereby deposit a pyrolytic graphite coating onto the mandrel. The mandrel may include a skirt template to provide the characteristic skirt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.