Thiourethane compound and photosensitive resin composition
US8283095B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 14, 2007 |
| Grant date | Oct 9, 2012 |
| Priority date | — |
| Expiry date | Nov 26, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/031
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii).wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.