Method for fabricating pixel structure
US8283197B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2010 |
| Grant date | Oct 9, 2012 |
| Priority date | — |
| Expiry date | Nov 26, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/0241
Abstract
A fabricating method for a pixel structure is provided. First, a substrate having an active device and a capacitor electrode line thereon is provided. Next, a passivation layer is formed on the substrate to cover the active device. After that, a light shielding layer is formed on the passivation layer to define a unit area. Next, an ink-jet printing is performed to form a color filter pattern within the unit area defined by the light shielding layer. After that, a portion of the color filter pattern is removed to form a first hole above active device. Next, the passivation layer exposed by the first hole is removed so as to form a contact hole exposing a portion of the active device. After that, a pixel electrode is formed on the color filter pattern to fill into the contact hole so as to electrically connect with active device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.