Patent · US Active

Method for preparing ion source from nanoparticles

US8283638B2 · kind B2 · utility

0Cited by
4References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 16, 2009
Grant dateOct 9, 2012
Priority date
Expiry dateMar 11, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/3171
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A method for preparing an ion source from nanoparticles is provided. The method includes the steps of: providing nanoparticles, vaporizing the nanoparticles from a solid state to a gaseous state, and ionizing the gas to form the ion source. The ion source is prepared by placing solid nanoparticles in a stainless tube, heating and vaporizing the solid nanoparticles into a gaseous state, and ionizing the gas. The gas can be formed at a lower heating temperature than when solid lumps are used because solid nanoparticles have a lower melting point than solid lumps. Thus, the heating temperature is lowered, and the preparing time of the ion source is shortened. Besides, under the same temperature, an ion source prepared from nanoparticles provides higher vapor pressure and allows a higher implantation dose than when the ion source is prepared from solid lumps, thus expanding the applicability of ion implantation technology.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.