5-transistor non-volatile memory cell
US8284600B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 8, 2010 |
| Grant date | Oct 9, 2012 |
| Priority date | — |
| Expiry date | Nov 13, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C16/0441
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A non-volatile memory (NVM) cell comprises an NMOS control transistor having commonly-connected source, drain and bulk region electrodes and a gate electrode connected to a storage node; a PMOS erase transistor having commonly-connected source, drain and bulk region electrodes and a gate electrode connected to the storage node; an NMOS data transistor having source, drain and bulk region electrodes and a gate electrode connected to the storage node, the bulk region electrode being connected to a common bulk node; the first NMOS pass gate transistor having a source electrode connected to the drain electrode of the NMOS data transistor, a drain electrode, a bulk region electrode connected to the common bulk node, and a gate electrode; and a second NMOS pass gate transistor having a drain electrode connected to the source electrode of the NMOS data transistor, a source electrode, a bulk region electrode connected to the common bulk node, and a gate electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.