Gas filling apparatus
US8286672B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2008 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | May 22, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This invention is about a gas filling apparatus for filling a gas into a storage apparatus for storing a semiconductor element or a reticle. The gas filling apparatus comprises a base and a port. The storage apparatus is loaded on the base. The port comprises a receiving part, which is connected with an air entrance of the storage apparatus. The contact portions of both the top of the receiving part and the air entrance of the storage apparatus are cambered surfaces and these two portions contacts in a ring fashion which is formed by the cambered surfaces mated with each other. The port also comprises a hole for the gas to pass through, and a joint port to connect with the air source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.