Gas filling apparatus
US8286674B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2008 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Aug 12, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67389
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A gas filling apparatus for filling a gas into a storage apparatus for storing a semiconductor element or a reticle is provided. The gas filling apparatus is connected with an air feed source, which includes a base, a first inlet port and a set of air feed source route. The storage apparatus is loaded on the base, and the first inlet port which is disposed on the base corresponds with the second inlet port of the storage apparatus. The set of air feed source route includes an entrance part, a supply part and a branch part. The entrance part is connected with the air feed source, and the supply part is connected with the first inlet port. The branch part is a closed loop, which transmits the gas from the entrance part into the supply part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.