Combined pumping system comprising a getter pump and an ion pump
US8287247B2 · kind B2 · utility
5Cited by
10References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2010 |
| Grant date | Oct 16, 2012 |
| Priority date | — |
| Expiry date | Mar 9, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J41/12
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A combined pumping system comprising a getter pump and an ion pump is described. The getter pump and the ion pump are mounted in series on a same flange and are respectively arranged on opposite sides thereof so that both getter and ion pumps conductance are maximized towards gas flux sources in a vacuum chamber in order to improve the vacuum level of the system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.