Internally located return electrode electrosurgical apparatus, system and method
US8292887B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2011 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Mar 30, 2031 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B2218/008
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A bipolar, plasma-generating electrosurgical apparatus and system wherein the return electrode is enclosed within an electrosurgical shaft, and the active electrode is located on the outside surface of the shaft such that in treating the tissue, the tissue is exposed to plasma generated on the active electrode, but is minimally exposed to electric fields generated between the active and return electrodes. Due to the configuration of the electrodes, electric fields generated between the electrodes are directed away from the target tissue and inwardly towards the return electrode within the shaft, thereby electrical stimulation of neuromuscular structures in the tissue by the electric fields is minimized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.