Method and device for manufacturing structure having pattern, and method for manufacturing mold
US8293125B2 · kind B2 · utility
4Cited by
5References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 5, 2006 |
| Grant date | Oct 23, 2012 |
| Priority date | — |
| Expiry date | Jan 26, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/09
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A structure having a pattern is manufactured. An elastically deformable process target is elastically deformed in an inplane direction from a first state. A first pattern is formed on the process target deformed. The elastically deformed process target is made close to or returned to the first state, thereby to form a second pattern having a size and a shape at least one of which differs from those of the first pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.