Patent · US Active

High frequency generator for ion and electron sources

US8294370B2 · kind B2 · utility

2Cited by

5References

26Claims

0Family size

Assignee

ASTRIUM GMBH · DE

Inventors

Werner Kadrnoschka · Neudenau, DE
Anton Lebeda · Neubiberg, DE
Rainer Killinger · Recklinghausen, DE
Johann Mueller · Affoltern am Albis, CH
Stefan Weis · Rötteln, DE

Key dates

Filing date	Jul 30, 2008
Grant date	Oct 23, 2012
Priority date	—
Expiry date	Jul 29, 2031

Classification

Technology area (CPC F)Mechanical Engineering; Lighting; Heating
CPC primaryF03H1/0018
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A device for coupling ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively is provided. The device includes: a discharge vessel for a gas, which is to be ionized; a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation; a coupling capacitor, which is electrically coupled to the coupling coil; a high frequency generator, which is electrically coupled to the coupling coil. The high frequency generator forms, together with the at least one coupling capacitor, a resonant circuit. The high frequency generator includes a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.