Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering
US8298381B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2006 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Dec 8, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3452
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vacuum process for etching a metal strip running over a backing roll facing a counterelectrode by magnetron sputtering, and a vacuum chamber etching installation implementing the process. A plasma is created in a gas close to the metal strip so as to generate radicals and/or ions that act on the strip, and at least one closed magnetic circuit, the width of which is approximately equal to that of the metal strip, is selected from a series of at least two closed magnetic circuits of different and fixed widths, then the selected magnetic circuit is positioned so as to face the metal strip, and then the etching of the moving metal strip is carried out.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.