Mask plate and manufacturing method thereof
US8298728B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2009 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Nov 25, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention discloses a mask plate and manufacturing method thereof. The mask plate comprises a substrate formed with a transparent region, a non-transparent region and a semi-transparent region. The semi-transparent region comprises a semi-transparent film, and a middle portion of the semi-transparent region is formed so that the intensity of the light transmitted therethrough is reduced in a larger extent than that in which the intensity of the light transmitted through the portion other than the middle portion in the semi-transparent region is reduced, whereby the light transmitted through the semi-transparent region is uniform.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.