Polymeric compound, positive resist composition, and method of forming resist pattern
US8298745B2 · kind B2 · utility
1Cited by
9References
5Claims
0Family size
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Key dates
| Filing date | Jun 11, 2008 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Dec 27, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/1811
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A polymeric compound including a structural unit (a0) represented by the structural unit (a0-1) shown below:(in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; R5 represents an alkyl group; R6 represents a substituent selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group; and e represents an integer of 0 to 5).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.