Patent · US Active

Process for removing residual monomers from water-absorbing polymer particles

US8299207B2 · kind B2 · utility

2Cited by
4References
11Claims
0Family size

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Key dates

Filing dateMar 23, 2011
Grant dateOct 30, 2012
Priority date
Expiry dateMar 23, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/2982
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A process for removing residual monomers from water-absorbing polymer particles, wherein the water-absorbing polymer particles are thermally aftertreated in a mixer with rotating mixing tools at a temperature of at least 60° C. in the presence of water vapor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.