Process for removing residual monomers from water-absorbing polymer particles
US8299207B2 · kind B2 · utility
2Cited by
4References
11Claims
0Family size
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Key dates
| Filing date | Mar 23, 2011 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Mar 23, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2982
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process for removing residual monomers from water-absorbing polymer particles, wherein the water-absorbing polymer particles are thermally aftertreated in a mixer with rotating mixing tools at a temperature of at least 60° C. in the presence of water vapor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.