Method and apparatus to reduce arcing in electrodeless lamps
US8299710B2 · kind B2 · utility
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57References
22Claims
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Key dates
| Filing date | Nov 4, 2011 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Nov 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B20/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A lamp and methods of forming are shown. In one example, a dielectric layer is formed over a gap between conductors in a plasma lamp. Electric arcing is reduced or eliminated, thus allowing tighter gaps and/or higher voltages. In one example a glass frit method is used to apply the dielectric layer. A lamp is shown with a barrier layer that prevents tarnish such as tarnish from sulfur exposure. The barrier layer reduces or prevents degradation of the lamp due to conversion of a conductor material to non-conductive tarnish material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.