Writing repeating patterns of features to a substrate
US8300505B2 · kind B2 · utility
0Cited by
8References
18Claims
0Family size
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Key dates
| Filing date | Mar 8, 2011 |
| Grant date | Oct 30, 2012 |
| Priority date | — |
| Expiry date | Mar 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/59688
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Method and apparatus for writing repeating patterns of features to a substrate, such as a data storage medium. In accordance with some embodiments, a multi-dimensional pattern of discrete features of different sizes to be written to a substrate is divided into a plurality of contiguous regions. A unique set of compensation values is assigned to each region. A write beam of a write system is used to write the features to the substrate responsive to said unique sets of compensation values so that all of the features having a common size in at least one region are written using the same compensation values from the associated set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.