Film stress management for MEMS through selective relaxation
US8304276B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Jan 26, 2012 |
| Grant date | Nov 6, 2012 |
| Priority date | — |
| Expiry date | Jan 26, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T74/1553
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An apparatus comprising a microelectromechanical system. The microelectromechanical system includes a crystalline structural element having dislocations therein. For at least about 60 percent of adjacent pairs of the dislocations, direction vectors of the dislocations form acute angles of less than about 45 degrees.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.