Sputtering target, transparent conductive film, and transparent electrode for touch panel
US8304359B2 · kind B2 · utility
27Cited by
5References
14Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 25, 2006 |
| Grant date | Nov 6, 2012 |
| Priority date | — |
| Expiry date | Jul 28, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B2235/767
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A sputtering target which is composed of a sintered body of an oxide containing indium, tin and zinc as main components; the atomic ratio of In/(In+Sn+Zn) being 0.10 to 0.35; the atomic ratio of Sn/(In+Sn+Zn) being 0.15 to 0.35; and the atomic ratio of Zn/(In+Sn+Zn) being 0.50 to 0.70; and containing a hexagonal layered compound shown by In2O3(ZnO)m, wherein m is an integer of 3 to 9, and a spinel structure compound shown by Zn2SnO4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.