Patent · US Active

System and method for processing high purity materials

US8308845B2 · kind B2 · utility

0Cited by
15References
65Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 17, 2010
Grant dateNov 13, 2012
Priority date
Expiry dateFeb 17, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/2931
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

Systems and methods for processing high purity materials are disclosed. A unit operation processes a material stream, an operational parameter of the unit operation is monitored, and a standby unit is charged with pressurized gas to achieve system pressure. The material stream is diverted to the standby unit in response to the operational parameter of the unit operation registering a threshold value. Flow exiting the standby unit is first vented via an outlet, and then directed toward a point of use after the pressurized gas has been purged. The unit operation may then be serviced and subsequently brought back online. A second unit operation may process a second material stream simultaneously, and the second material stream may be periodically diverted to the standby unit in like manner, thus reducing line pressure variation. The disclosed method may be performed manually or implemented automatically through use of a controller.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.