Method for forming dye sublimation images in solid substrates
US8308891B2 · kind B2 · utility
22Cited by
41References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 22, 2006 |
| Grant date | Nov 13, 2012 |
| Priority date | — |
| Expiry date | Jun 13, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1476
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method for forming a dye sublimation image in a plastic substrate with a sheet having an image formed thereon of a sublimatic dyestuff is provided. The image on the sheet with a treatment that deposits a silicon compound is placed against a first surface of the substrate. The sheet is heated to a sublimation temperature, which causes the image of the sheet to sublimate into the substrate. The sheet is cooled to a release temperature. The sheet is removed from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.