Microfluidic systems and methods for screening plating and etching bath compositions
US8308929B2 · kind B2 · utility
1Cited by
42References
17Claims
0Family size
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Inventor
Key dates
| Filing date | Jun 4, 2009 |
| Grant date | Nov 13, 2012 |
| Priority date | — |
| Expiry date | Mar 16, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D21/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and systems for screening for the effect of bath composition on the performance of electroplating, electroless-plating, electrochemical-etching, electropolishing, and chemical-etching processes are provided. The methods and systems use microfluidic channels that allow for etching or plating studies on an electrode exposed to a multitude of bath compositions at different positions on its surface. After deposition or etching, the electrode surface can be quickly and easily detached from the device for analysis of deposited or etched film properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.