Substrate having an electron donating surface with metal particles comprising palladium on said surface
US8309216B2 · kind B2 · utility
23Cited by
16References
20Claims
0Family size
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Key dates
| Filing date | Apr 5, 2007 |
| Grant date | Nov 13, 2012 |
| Priority date | — |
| Expiry date | Jan 5, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31678
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
The invention relates to a substrate with an electron donating surface, having metal particles on its surface, the metal particles including palladium and at least one metal selected from gold, ruthenium, rhodium, osmium, iridium, and platinum, wherein the amount of the metal particles is from about 0.001 to about 8 μg/cm2. A method of manufacturing the substrate including the steps a) depositing metal particles from a suspension of metal particles onto the substrate, b) rising and c) drying.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.