Guided self-assembly of block copolymer line structures for integrated circuit interconnects
US8309278B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2010 |
| Grant date | Nov 13, 2012 |
| Priority date | — |
| Expiry date | Feb 22, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24669
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Complex self-assembled patterns can be created using a sparse template and local changes to the shape or distribution of the posts of the template to direct pattern generation of block copolymer. The post spacing in the template is formed commensurate with the equilibrium periodicity of the block copolymer, which controls the orientation of the linear features. Further, the posts can be arranged such that the template occupies only a few percent of the area of the final self-assembled patterns. Local aperiodic features can be introduced by changing the period or motif of the lattice or by adding guiding posts. According to one embodiment, an array of carefully spaced and shaped posts, prepared by electron-beam patterning of an inorganic resist, can be used to template complex patterns in a cylindrical-morphology block copolymer. These complex self-assembled patterns can form a mask used in fabrication processes of arbitrary structures such as interconnect layouts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.