Preparation and manufacture of an overlayer for deactivation resistant photocatalysts
US8309484B2 · kind B2 · utility
1Cited by
9References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 2007 |
| Grant date | Nov 13, 2012 |
| Priority date | — |
| Expiry date | Jul 8, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249981
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A photocatalyst system for volatile organic compounds with two parts that include a photocatalyst layer on a substrate and a porous overlayer. The photocatalyst layer is reactive with volatile organic compounds when UV light is projected on it. The overlayer is situated on the photocatalyst layer. The overlayer is UV transparent and has an interconnected pore network that allows contaminated air to pass through the overlayer. The size and the shape of the interconnected pores acts to selectively exclude certain contaminants that can deactivate the photocatalyst.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.