Patent · US Active

Method of manufacturing a patterned media stamper

US8312609B2 · kind B2 · utility

0Cited by
10References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 23, 2008
Grant dateNov 20, 2012
Priority date
Expiry dateApr 3, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49982
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

The invention relates to a method of manufacturing a patterned media Ni stamper comprising depositing a perfluorodecyltrichlorosilane release layer. The release layer eliminates bonding at the master-stamper interface. A permanent master for manufacturing a patterned media stamper is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.