Methods for globally treating silica optics to reduce optical damage

US8313662B2 · kind B2 · utility

Assignee

• Lawrence Livermore National Security, LLC · US

Inventors

• Philip E. Miller · Livermore, US
• Tayyab I. Suratwala · Pleasanton, US
• Jeffrey D. Bude · New Providence, US
• Nan Shen · Nanhu, CN
• William Augustus Steele · Tracy, US
• Ted Laurence · Livermore, US
• Michael Dennis Feit · Livermore, US
• Lana L. Wong · Pleasanton, US

Key dates

• Filing date: Oct 1, 2009
• Grant date: Nov 20, 2012
• Expiry date: Dec 4, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C23/007
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.