Telecentricity corrector for microlithographic projection system
US8314922B2 · kind B2 · utility
2Cited by
5References
14Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 30, 2009 |
| Grant date | Nov 20, 2012 |
| Priority date | — |
| Expiry date | Mar 22, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/4222
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A telecentricity corrector is incorporated into a microlithographic projection system to achieve telecentricity targets at the output of the microlithographic projection system. The telecentricity corrector is located between an illuminator and a projection lens of the projection system, preferably just in advance of a reticle for controlling angular distributions of light illuminating the reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.