Directional solidification furnace for reducing melt contamination and reducing wafer contamination
US8317920B2 · kind B2 · utility
2Cited by
2References
24Claims
0Family size
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Key dates
| Filing date | Sep 19, 2009 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | Nov 7, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1092
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A directional solidification furnace includes a crucible for holding molten silicon and a lid covering the crucible and forming an enclosure over the molten silicon. The crucible also includes an inlet in the lid for introducing inert gas above the molten silicon to inhibit contamination of the molten silicon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.