Patent · US Active

Directional solidification furnace for reducing melt contamination and reducing wafer contamination

US8317920B2 · kind B2 · utility

2Cited by
2References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 19, 2009
Grant dateNov 27, 2012
Priority date
Expiry dateNov 7, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1092
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A directional solidification furnace includes a crucible for holding molten silicon and a lid covering the crucible and forming an enclosure over the molten silicon. The crucible also includes an inlet in the lid for introducing inert gas above the molten silicon to inhibit contamination of the molten silicon.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.