Fabrication of nanostructured devices
US8318386B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 6, 2009 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | Mar 25, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the invention relate to methods useful in the fabrication of nanostructured devices for optics, energy generation, displays, consumer electronics, life sciences and medicine, construction and decoration. Instead of nanostructuring using colloids of particles, special vacuum deposition methods, laser interference systems (holography), and other low-throughput limited surface area techniques, we suggest to use nanotemplate created by novel nanolithography method, “Rolling mask” lithography. This method allows fast and inexpensive fabrication of nanostructures on large areas of substrate materials in conveyor-type continuous process. Such nanotemplate is then used for selective deposition of functional materials. One of embodiments explains deposition of functional materials in the exposed and developed areas of the substrate. Another embodiment uses selective deposition of the functional material on top of such template. Alternatively, nanotemplate is deposited and patterned on functional material, and then used as an etch mask to transfer nanostructure into the functional material using dry or wet etching process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.