Patent · US Active

Composition for manufacturing SiO2 resist layers and method of its use

US8318613B2 · kind B2 · utility

1Cited by

0References

35Claims

0Family size

Assignee

Merck Patent GmbH · DE

Inventors

Werner Stockum · Reinheim, DE
Ingo Koehler · Darmstadt, DE
Arjan Meijer · Darmstadt, DE
Paul Craig Brookes · Southampton, GB
Katie Patterson · Portsmouth, GB
Mark James · Romsey, GB

Key dates

Filing date	Mar 2, 2009
Grant date	Nov 27, 2012
Priority date	—
Expiry date	Mar 2, 2029

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C18/12
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

The present invention relates to compositions, which are useful for the generation of patterned or structured SiO2-layers or of SiO2-lines during the manufacturing process of semiconductor devices, and which are suitable for the application in inkjet operations. The present invention also relates to a modified process of manufacturing semiconductor devices taking advantage of these new compositions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.