Scanned writing of an exposure pattern on a substrate having a spot size modulator and dual motor for moving the substrate table and a laser spot relative to each other
US8319174B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2008 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | Sep 18, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure pattern is written on a substrate, by scanning a light spot along a trajectory over the substrate and switching it on and off according to a desired pattern. Respective spot sizes of the light for illuminating the substrate in respective parts of the trajectory according to a geometry of the pattern. Respective pitch values between successive ones of the parts of the trajectory are selected, in relation to the spot size selected for the respective parts. The light spot is scanned over the substrate along the trajectory, with the selected pitch values between the trajectory parts and a position dependent spot size along the trajectory. In an embodiment a helical trajectory is used.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.