Patent · US Active

Method for designing two-dimensional array overlay targets and method and system for measuring overlay errors using the same

US8321821B2 · kind B2 · utility

2Cited by
7References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 2009
Grant dateNov 27, 2012
Priority date
Expiry dateDec 9, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F30/39
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for designing a two-dimensional array overlay target comprises the steps of: selecting a plurality of two dimensional array overlay targets having different overlay errors; calculating a deviation of a simulated diffraction spectrum for each two-dimensional array overlay target; selecting an error-independent overlay target by taking the deviations of the simulated diffraction spectra into consideration; and designing a two dimensional array overlay target based on structural parameters of the error-independent overlay target.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.