Fabrication method and fabrication apparatus of head using near field light
US8323518B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 3, 2007 |
| Grant date | Dec 4, 2012 |
| Priority date | — |
| Expiry date | Oct 17, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2005/0021
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing a near-field optical head. A first projection shaped in a quadrangular pyramid is formed on a surface of a substrate for providing a near-field optical element of the near-field optical head. A second projection shaped in a frustum of quadrangular pyramid is formed on the surface of the substrate for providing an air bearing surface of the near-field optical head. A metal film is formed on at least one surface of the first projection and the metal film is connected with a resistance meter through a conduction wiring for detecting an electrical resistance of the metal film. The first and second projections and the metal film are polished while the resistance meter detects an electrical resistance of the metal film and until the detected electrical resistance reaches a predetermined value such that a top surface of the first projection has a specified size and becomes flush with a surface of the second projection providing the air bearing surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.