Patent · US Active

Positive resist processing liquid composition and liquid developer

US8323880B2 · kind B2 · utility

1Cited by

3References

4Claims

0Family size

Assignee

Kanto Kagaku Kabushiki Kaisha · JP

Inventors

Yutaka Murakami · Yokohama, JP
Norio Ishikawa · Osaka, JP
Taku Murata · Tokyo, JP
Kenji Saito · Ebeye, US
Ryosuke Araki · Tokyo, JP

Key dates

Filing date	Aug 10, 2007
Grant date	Dec 4, 2012
Priority date	—
Expiry date	Feb 8, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/322
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Disclosed is a positive resist processing liquid composition which is composed of an aqueous solution containing a quaternary ammonium hydroxide represented by the following general formula (I).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.