Method of producing transparent conductive film glass
US8327664B2 · kind B2 · utility
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15References
12Claims
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Key dates
| Filing date | Jul 12, 2010 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Jul 20, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/94
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for producing transparent conductive glass by a) depositing two barrier layers on the surface of hot glass by chemical vapor deposition; and b) depositing two conductive film layers on the surface of the glass ribbon having the two barrier layers. The method is easy to control and suitable for mass production. The resultant transparent conductive glass has low surface resistance and moderate haze.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.