Low-temperature, converging, reactive gas source and method of use
US8328982B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 18, 2006 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Sep 10, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3151
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Devices and methods for generating a low-temperature, atmospheric pressure plasma are disclosed. A plasma device may include a first electrode having an inlet for a gas, a second electrode having an outlet for the gas and disposed proximate to the first electrode to form a substantially uniform gap therebetween. The gas flows along the substantially uniform gap and from a plurality of different directions to converge and flow through the outlet. High frequency electrical power is applied between the first electrode and the second electrode to generate a plasma within the gas flow emerging at the outlet. Precursor chemicals are added to the plasma flow at the outlet. Various electrode designs may be implemented and various applications involving surface treatment of materials with the low-temperature atmospheric plasma, including surface activation, cleaning, sterilization, etching and deposition of thin films are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.