Methods for producing omni-directional multi-layer photonic structures
US8329247B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 19, 2009 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Oct 14, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.