Patent · US Active

Methods for producing omni-directional multi-layer photonic structures

US8329247B2 · kind B2 · utility

19Cited by
61References
20Claims
0Family size

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Key dates

Filing dateFeb 19, 2009
Grant dateDec 11, 2012
Priority date
Expiry dateOct 14, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B27/0012
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.