Methods and apparatuses for depositing nanometric filamentary structures
US8329257B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2010 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Oct 7, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The invention relates to a method for depositing nanometric filamentary structures. The method comprises passing a gaseous phase comprising the nanometric filamentary structures through a space defined between at least two electrodes generating an electric field, for depositing the nanometric filamentary structures on at least one of the electrodes; and at least substantially preventing the deposited nanometric filamentary structures from bridging the electrodes during the deposition. The invention also relates to an apparatus for depositing nanometric filamentary structures as well as to methods and apparatuses for monitoring the production of nanometric filamentary structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.