Method for fabricating high aspect ratio nanostructures
US8334084B2 · kind B2 · utility
2Cited by
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13Claims
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Key dates
| Filing date | Aug 19, 2011 |
| Grant date | Dec 18, 2012 |
| Priority date | — |
| Expiry date | Aug 19, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T83/05
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for fabricating high aspect ratio nanostructures is provided. The method uses a nanomachining tip of an atomic force microscope to create an orthogonal series of isolated cuts that define a grid of high aspect ratio nanostructures in a work area on a substrate. Additional material can then be removed to smooth out at least one of the nanostructures in the work area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.