Mask defect analysis
US8335369B2 · kind B2 · utility
2Cited by
15References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 2007 |
| Grant date | Dec 18, 2012 |
| Priority date | — |
| Expiry date | Jan 13, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of inspecting a photomask includes directing radiation from a radiation source onto a photomask so that at least a portion of the radiation is transmitted through the photomask. A first photomask image is detected from the transmitted portion of the radiation transmitted through the photomask and perceptible at a second side of the photomask. A second photomask image is created by applying an exposure simulation model to a photomask design. A difference between the first photomask image and the second photomask image is then determined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.