Method for manufacturing optical nonreciprocal element
US8335407B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 25, 2008 |
| Grant date | Dec 18, 2012 |
| Priority date | — |
| Expiry date | Jun 3, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2201/07
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel technique is provided, which can secure sufficient adhesion of an Si layer and a magneto-optical material layer while avoiding occurrence of cracks when fabricating an optical nonreciprocal element by bonding the Si layer on which a rib waveguide is formed, and the magneto-optical material layer. The method includes forming a waveguide on the Si layer of an SOI substrate which is a first substrate, forming a first thin-film buffer layer on the aforesaid waveguide, forming a second thin-film buffer layer on an magneto-optical material layer deposited on a second substrate by using a same material as that of the aforesaid first thin-film buffer layer, and bonding the aforesaid first thin-film buffer layer and the aforesaid second thin-film buffer layer in placement where a light propagating in the aforesaid waveguide can be caused to generate nonreciprocal phase change by the aforesaid magneto-optical material layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.