Method and device for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method
US8336337B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2003 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Feb 24, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B2201/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to a method for producing a blank mold from synthetic quartz glass by using a plasma-assisted deposition method, according to which a hydrogen-free media flow containing a glass starting material and a carrier gas is fed to a multi-nozzle deposition burner. The glass starting material is introduced into a plasma zone by the deposition burner and is oxidized therein while forming SiO2 particles, and the SiO2 particles are deposited on a deposition surface while being directly vitrified. In order to increase the deposition efficiency, the invention provides that the deposition burner (1) focuses the media flow toward the plasma zone (4) by. A multi-nozzle plasma burner, which is suited for carrying out the method and which is provided with a media nozzle for feeding a media flow to the plasma zone, is characterized in that the media nozzle (7) is designed so that it is focussed toward the plasma zone (4). The focussing is effected by a tapering (6) of the media nozzle (7).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.