Thermal evaporation apparatus, use and method of depositing a material

US8336489B2 · kind B2 · utility

Inventors

• Volker Probst · Berlin, DE
• Walter Stetter · Illertissen, DE

Key dates

• Filing date: Oct 18, 2011
• Grant date: Dec 25, 2012
• Expiry date: Oct 18, 2031

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/28
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A thermal evaporation apparatus for depositing of a material on a substrate is described. The apparatus can comprise material storage means; heating means to generate a vapour of the material in the material storage means; vapour outlet means comprising a vapour receiving pipe having vapour outlet passages, and emission reducing means arranged such that an external surface of the vapour outlet means directed to said substrate exhibits low emission. Also the use of the apparatus, and a method of depositing a material onto a substrate by thermal evaporation are described.