Method for depositing a polymer layer containing nanomaterial on a substrate material and apparatus
US8337957B2 · kind B2 · utility
1Cited by
12References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2006 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Jan 3, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3277
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
The invention relates to a method for depositing a polymer layer containing nanoparticles on a substrate material. The method comprises the steps of providing the substrate material, providing a polymerization material near a surface of the substrate material, conducting a gas flow near the surface of the substrate material, the gas flow comprising a nanomaterial, and depositing the polymer layer at the surface of the substrate material by applying a plasma polymerization process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.