Patent · US Active

Sputtering composite target, method for manufacuturing transparent conductive film using the same and transparent conductive film-provided base material

US8338002B2 · kind B2 · utility

2Cited by
24References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 4, 2009
Grant dateDec 25, 2012
Priority date—
Expiry dateDec 24, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31938
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A sputtering composite target includes: an oxide based component containing indium oxide; and a carbon based component.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.